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DOI: 10.1051/jp2:1994243
J. Phys. II France 4 (1994) 1975-1980

Atomic Fresnel images and possible applications in atom lithography

U. Janicke and M. Wilkens

Fakultät für Physik, Universität Konstanz, 78434 Konstanz, Germany

(Received 24 May 1994, revised 6 July 1994, accepted 10 August 1994)

Abstract
In the near field regime of diffractive atom optics, amplitude corrugations of the de Broglie wave front are important and can lead to interesting effects. One class of near field phenomena is the formation of Fresnel images. We study this effect and possible applications in atom lithography using wave packet simulations.



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