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Second wind of the oblique deposition method of liquid‐crystal alignment: Ion‐beam sputtering technique
A. Khakhlou, A. Murauski, O. Yaroshchuk, E. Telesh and R. Kravchuk Journal of the Society for Information Display 14(3) 257 (2006) https://doi.org/10.1889/1.2185274
Disappearance of aligning properties of deposited SiOx films as caused by external factors
Plasma beam alignment for the large‐area substrates: Equipment and process
O. V. Yaroshchuk, R. M. Kravchuk, A. M. Dobrovolskyy, P. C. Liu and C. D. Lee Journal of the Society for Information Display 13(4) 289 (2005) https://doi.org/10.1889/1.1904928
The Multimode LC Alignment on the Substrates Obliquely Treated with a Plasma Flux