J. Phys. II France
Volume 2, Numéro 6, June 1992
Page(s) 1353 - 1361
DOI: 10.1051/jp2:1992205
J. Phys. II France 2 (1992) 1353-1361

Ellipsometric in situ study of the titanium surfaces during the anodization

A. T. Efremova and Lj. D. Arsov

Faculty of Technology and Metallurgy, University "Cyril and Metodij", 91000 Skopje, Yugoslavia

(Received 27 November 1991, accepted in final form 17 February 1992)

The titanium surfaces immersed in 0.5 -3 H 2SO 4 and anodized in the voltage region from 0 to 100 V have been studied by in situ ellipsometric measurements. The thickness, inhomogeneity, and porosity of the formed films rise with increasing applied voltage. A computational method is presented for obtaining both the refractive indices and thickness of an unknown film on a reflecting substrate of know optical constants. The complex index of refraction and thickness of generated films were calculated comparing the theoretical computed curve with experimental loci $\Delta$ and $\Psi$ obtained from in situ ellipsometric measurements.

07.60F - 78.65 - 68J

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