DOI: 10.1051/jp2:1993116
J. Phys. II France 3 (1993) 139-146

On the morphology of a lamellar triblock copolymer film

Wim H. de Jeu¹, Peter Lambooy¹, Ian W. Hamley¹, David Vaknin², Jan Skov Pedersen², Kristian Kjaer², Roger Seyger³, Paul van Hutten³ and Georges Hadziioannou<sup>3

1</sup>  FOM-Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands
²  Risø National Laboratory, P.O. Box 49, 4000-Roskilde, Denmark
³  Department of Chemistry, University of Groningen, Nijenborgh 16, 9747 AG Groningen, The Netherlands

(Received 15 July 1992, accepted in final form 22 September 1992)

Abstract
X-ray and neutron reflectivity are used to study the morphology of a triblock copolymer of d-poly(styrene) and poly(2-vinylpyridine) in the form P2VP ₃₀-dPS ₆₀-P2VP ₃₀ deposited as a film on a silicon wafer. Microphase separation leads to a lamellar film which is strongly quantized in layers of about 300 Å each and with P2VP at the silicon substrate. The confinement of the polymer ends to the same plane leads for the top layer to a "looping" of the polymer, so that the middle PS part can still wet the air interface completely.

PACS
36.20 - 61.40K - 68.60

© Les Editions de Physique 1993