J. Phys. II France
Volume 3, Numéro 1, January 1993
Page(s) 139 - 146
DOI: 10.1051/jp2:1993116
J. Phys. II France 3 (1993) 139-146

On the morphology of a lamellar triblock copolymer film

Wim H. de Jeu1, Peter Lambooy1, Ian W. Hamley1, David Vaknin2, Jan Skov Pedersen2, Kristian Kjaer2, Roger Seyger3, Paul van Hutten3 and Georges Hadziioannou3

1  FOM-Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands
2  Risø National Laboratory, P.O. Box 49, 4000-Roskilde, Denmark
3  Department of Chemistry, University of Groningen, Nijenborgh 16, 9747 AG Groningen, The Netherlands

(Received 15 July 1992, accepted in final form 22 September 1992)

X-ray and neutron reflectivity are used to study the morphology of a triblock copolymer of d-poly(styrene) and poly(2-vinylpyridine) in the form P2VP 30-dPS 60-P2VP 30 deposited as a film on a silicon wafer. Microphase separation leads to a lamellar film which is strongly quantized in layers of about 300 Å each and with P2VP at the silicon substrate. The confinement of the polymer ends to the same plane leads for the top layer to a "looping" of the polymer, so that the middle PS part can still wet the air interface completely.

36.20 - 61.40K - 68.60

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